Journal
ACS NANO
Volume 10, Issue 2, Pages 2745-2751Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsnano.5b07831
Keywords
atomically thin mesoporous nanomesh of graphitic-C3N4; solvothermal exfoliation; freeze-drying self-assembly; photocatalysis; hydrogen evolution
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Funding
- NSFC [21325415, 21174019]
- National Basic Research Program of China [2011CB013000]
- Beijing Natural Science Foundation [2152028]
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Delamination of layer materials into two-dimensional single atom sheets has induced exceptional physical properties, including large surface area, ultrahigh intrinsic carrier mobility, pronounced changes in the energy band structure, and other properties. Here, atomically thin mesoporous nanomesh of graphitic carbon nitride (g-C3N4) is fabricated by solvothermal exfoliation of mesoporous g-C3N4 bulk made from thermal polymerization of freeze-drying assembled Dicyandiamide nanostructure precursor. With the unique structural advantages for aligned energy levels, electron transfer, light harvesting, and the richly available reaction sites, the as-prepared monolayer of mesoporous g-C3N4 nanomesh exhibits a superior photocatalytic hydrogen evolution rate of 8510 mu mol h(-1) g(-1) under lambda > 420 nm and an apparent quantum efficiency of 5.1% at 420 nm, the highest of all the metal-free g-C3N4 nanosheets photocatalysts.
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