Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 8, Issue 13, Pages 8329-8334Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsami.6b01021
Keywords
suspended graphene; block copolymer nanolithography; TiO2-covered nanopillars; selective-area photocatalysis; graphene nanomesh
Funding
- Danish National Research Foundation Center for Nanostructured Graphene, CNG [DNRF103]
- Department. of Micro and Nano technology at the Technical University of Denmark
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Nanostructured graphene exhibits many intriguing properties. For example, precisely controlled graphene nanomeshes can be applied in electronic, photonic, or sensing devices. However, fabrication of nanopatterned graphene with periodic supperlattice remains a challenge. In this work, periodic graphene nanomesh was fabricated by photocatalysis of single-layer graphene suspended on top of TiO2-covered nanopillars, which were produced by combining block copolymer nanolithography with atomic layer deposition. Graphene nanoribbons were also prepared by the same method applied to a line-forming block copolymer template. This mask-free and nonchemical/nonplasma route offers an exciting platform for nanopatterning of graphene and other UV-transparent materials for device engineering.
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