Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume 48, Issue 2, Pages 1223-1234Publisher
SPRINGER
DOI: 10.1007/s11664-018-06872-2
Keywords
TiO2 thin film; sputtering; spectroscopic ellipsometry; optical properties
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Funding
- Ministry of Human Resource and Development (MHRD), Government of India [MHR02-41-126-429]
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In this article, we have reported the structural optimization and optical properties of anatase titanium dioxide (TiO2) thin films grown by direct current magnetron sputtering on a glass substrate at room temperature (RT). The x-ray diffraction measurement revealed anatase phase of TiO2 with preferred orientation (101). The morphological, compositional and topographical properties of the samples are explored by scanning electron microscopy, x-ray photoelectron spectroscopy and atomic force microscopy, respectively. The optical properties such as refractive index n, extinction coefficient k and optical bandgap E-g are determined in the broad wavelength range of 246-1688nm using variable angle spectroscopic ellipsometry accounting for the surface properties in the optical stack model. Moreover, the nonlinear refractive index n(2) and the third-order nonlinear optical susceptibility ((3)) are determined using the Tichy-Ticha relation and Wemple-Didomenico (WDD) parameters. The ratio of the carrier concentration to the effective mass N/m* has also been determined. The current research on the optical and dispersion energy parameters of RT grown anatase TiO2 thin films is expected to have a significant impact on advanced flexible optical, optoelectronic, and photonic applications.
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