4.6 Article

Atomic layer deposition of titanium nitride for quantum circuits

Journal

APPLIED PHYSICS LETTERS
Volume 113, Issue 21, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.5053461

Keywords

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Funding

  1. Army Research Office [W911NF-17-C-0024]
  2. MRSEC [NSF DMR-1420709]
  3. Soft and Hybrid Nanotechnology Experimental (SHyNE) Resource (NSF), a node of the National Science Foundation's National Nanotechnology Coordinated Infrastructure [ECCS-1542205]
  4. U.S. Department of Energy, Office of Science, Basic Energy Sciences, Materials Science and Engineering Division
  5. U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences [DE-AC02-06CH11357]

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Superconducting thin films with high intrinsic kinetic inductance are of great importance for photon detectors, achieving strong coupling in hybrid systems, and protected qubits. We report on the performance of titanium nitride resonators, patterned on thin films (9-110 nm) grown by atomic layer deposition, with sheet inductances of up to 234 pH/square. For films thicker than 14 nm, quality factors measured in the quantum regime range from 0.2 to 1.0 x 10(6) and are likely limited by dielectric twolevel systems. Additionally, we show characteristic impedances up to 28 k Omega, with no significant degradation of the internal quality factor as the impedance increases. These high impedances correspond to an increased single photon coupling strength of 24 times compared to a 50 Omega resonator, transformative for hybrid quantum systems and quantum sensing. Published by AIP Publishing.

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