4.8 Article

Gate-Controlled Metal-Insulator Transition in TiS3 Nanowire Field-Effect Transistors

Journal

ACS NANO
Volume 13, Issue 1, Pages 803-811

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.8b08260

Keywords

titanium trisulfide; transition-metal trichalcogenides; metal-insulator transition; charge-density wave; one-dimensional nanostructures

Funding

  1. National Science Foundation [NSF-ECCS 1740136, 1508541]
  2. NCORE
  3. Centre National de la Recherche Scientifique (CNRS), France
  4. Commissariat a l'Energie Atomique et aux Energies Alternatives (CEA), France
  5. French National Research Agency (ANR) as part of the Investissements d'Avenir [ANR-17-CE09-0016-05]
  6. U.S. Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering [DE-FG02-04ER46180]

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We explore the electrical characteristics of TiS3 nanowire field-effect transistor (FETs), over the wide temperature range from 3 to 350 K. These nanomaterials have a quasi-one-dimensional (1D) crystal structure and exhibit a gate-controlled metal-insulator transition (MIT) in their transfer curves. Their room-temperature mobility is similar to 20-30 cm(2)/(V s), 2 orders of magnitude smaller than predicted previously, a result that we explain quantitatively in terms of the influence of polar-optical phonon scattering in these materials. In the insulating state (

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