Journal
NANOSCALE RESEARCH LETTERS
Volume 8, Issue -, Pages -Publisher
SPRINGER
DOI: 10.1186/1556-276X-8-410
Keywords
Silicon nanohole; Electroless deposition; Noble metal dot arrays; Metal-assisted chemical etching; High aspect ratio; Anodic porous alumina
Funding
- Japan Society for the Promotion of Science [20241026]
- Ministry of Education, Culture, Sports, Science and Technology of Japan (MEXT)
- Grants-in-Aid for Scientific Research [23760703, 20241026] Funding Source: KAKEN
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Sub-100-nm silicon nanohole arrays were fabricated by a combination of the site-selective electroless deposition of noble metals through anodic porous alumina and the subsequent metal-assisted chemical etching. Under optimum conditions, the formation of deep straight holes with an ordered periodicity (e.g., 100 nm interval, 40 nm diameter, and high aspect ratio of 50) was successfully achieved. By using the present method, the fabrication of silicon nanohole arrays with 60-nm periodicity was also achieved.
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