3.8 Article

Graphitic carbon growth on crystalline and amorphous oxide substrates using molecular beam epitaxy

Journal

NANOSCALE RESEARCH LETTERS
Volume 6, Issue -, Pages -

Publisher

SPRINGER
DOI: 10.1186/1556-276X-6-565

Keywords

graphite; molecular beam epitaxy; Raman; oxide

Funding

  1. Priority Research Center [20110018395]
  2. Basic Science Research Program [2011-0026292]
  3. Center for Topological Matter in POSTECH through the National Research Foundation of Korea (NRF) [2011-0030046]
  4. Ministry of Education, Science and Technology (MEST)
  5. Daegu Gyeongbuk Institute of Science and Technology (DGIST) (Convergence Technology with New Renewable Energy and Intelligent Robot)
  6. National Research Foundation of Korea [2010-0024426, 2010-0020207] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

Ask authors/readers for more resources

We report graphitic carbon growth on crystalline and amorphous oxide substrates by using carbon molecular beam epitaxy. The films are characterized by Raman spectroscopy and X-ray photoelectron spectroscopy. The formations of nanocrystalline graphite are observed on silicon dioxide and glass, while mainly sp(2) amorphous carbons are formed on strontium titanate and yttria-stabilized zirconia. Interestingly, flat carbon layers with high degree of graphitization are formed even on amorphous oxides. Our results provide a progress toward direct graphene growth on oxide materials.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

3.8
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available