4.6 Article

Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour

Related references

Note: Only part of the references are listed.
Article Engineering, Electrical & Electronic

High aspect-ratio SU-8 resist nano-pillar lattice by e-beam direct writing and its application for liquid trapping

D. Lopez-Romero et al.

MICROELECTRONIC ENGINEERING (2010)

Review Nanoscience & Nanotechnology

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

A. E. Grigorescu et al.

NANOTECHNOLOGY (2009)

Article Chemistry, Multidisciplinary

Fabrication of luminescent nanoarchitectures by electron irradiation of polystyrene

Hyeok Moo Lee et al.

ADVANCED MATERIALS (2008)

Review Engineering, Electrical & Electronic

Nanoimprint lithography: An old story in modern times? A review

Helmut Schift

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2008)

Article Engineering, Electrical & Electronic

Lithography and other patterning techniques for future electronics

R. Fabian Pease et al.

PROCEEDINGS OF THE IEEE (2008)

Article Engineering, Electrical & Electronic

Comparison of high resolution negative electron beam resists

B. Bilenberg et al.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2006)

Article Chemistry, Multidisciplinary

Nanoscience and nanotechnotogy: A personal view of a chemist

V Balzani

SMALL (2005)

Article Chemistry, Multidisciplinary

Nanoscience, nanotechnology, and chemistry

GM Whitesides

SMALL (2005)

Review Engineering, Electrical & Electronic

Recent developments in micromilling using focused ion beam technology

AA Tseng

JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2004)

Article Engineering, Electrical & Electronic

Fabrication of curved structures with electron-beam and surface structure characterization

JK Chen et al.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2004)

Article Multidisciplinary Sciences

Ultrafast and direct imprint of nanostructures in silicon

SY Chou et al.

NATURE (2002)

Article Chemistry, Physical

Electron beam lithography: resolution limits and applications

C Vieu et al.

APPLIED SURFACE SCIENCE (2000)