Journal
JOURNAL OF MATERIALS CHEMISTRY B
Volume 2, Issue 31, Pages 4983-4987Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c4tb00833b
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Funding
- National Science Foundation under NSF [ECS-0335765]
- Air Force Office of Scientific Research [AFOSR-FA9550-10-1-0172]
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Current methods to produce silk films include casting and spin coating. Here we introduce a new method for the fabrication of silk films: electrogelation. Through use of a closed-loop anode, films with high surface smoothness and optical transparency are produced. Bending the electrode loop allows films with three-dimensional topologies to be formed, possessing thicknesses capable of descending into the submicron thin film regime.
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