4.6 Article

Electrodeposited 3D porous silicon/copper films with excellent stability and high rate performance for lithium-ion batteries

Journal

JOURNAL OF MATERIALS CHEMISTRY A
Volume 2, Issue 8, Pages 2478-2481

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c3ta14645f

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Funding

  1. Fundamental R&D Program for Core Technology of Materials by the Ministry of Knowledge Economy
  2. Ministry of Trade, Industry and Energy, Republic of Korea

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We report a simple two-step fabrication process of 3D porous Si/copper films by an electrodeposition method using a hydrogen gas bubble template. A 3D porous Si/copper film provides a large surface area, a highly conductive pathway, a short ion diffusion length, and buffer spaces to accommodate the stress during the cycling processes.

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