Journal
IEEE JOURNAL OF PHOTOVOLTAICS
Volume 1, Issue 1, Pages 54-58Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JPHOTOV.2011.2165698
Keywords
Compensated; light-induced degradation; n-type; silicon
Funding
- Australian Research Council
Ask authors/readers for more resources
In this paper, we present experimental data regarding the recombination activity and concentration of the boron-oxygen complex in compensated n-type silicon, doped with phosphorus and boron, when subjected to illumination. Unlike the data of Bothe et al. in n-type silicon compensated with thermal donors, our results suggest the dominant defect level in our doping range to be a shallow level (E-C-E-T = 0.15 eV), with a capture cross-section ratio sigma(n)/sigma(p) of around 0.006, suggesting a negatively charged center. We also confirm previous results showing an increasing defect density with bias light intensity. Due to the strong lifetime reduction observed, we suggest that this material might not be suited to make high-efficiency n-type solar cells, unless practical strategies to reduce the defect concentration can be developed.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available