Journal
SCIENTIFIC REPORTS
Volume 1, Issue -, Pages -Publisher
NATURE PUBLISHING GROUP
DOI: 10.1038/srep00175
Keywords
-
Categories
Funding
- NSF Nano-scale Science and Engineering Center (NSEC) for Scalable and Integrated Nanomanufacturing (SINAM) [CMMI-0751621]
- Computer Mechanics Laboratory (CML) of University of California, Berkeley
- Directorate For Engineering [0751621] Funding Source: National Science Foundation
- Div Of Civil, Mechanical, & Manufact Inn [0751621] Funding Source: National Science Foundation
Ask authors/readers for more resources
Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available