Journal
OPTICAL MATERIALS EXPRESS
Volume 3, Issue 4, Pages 502-510Publisher
OPTICAL SOC AMER
DOI: 10.1364/OME.3.000502
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Funding
- NSF [NSF-DMR0801786]
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [1206979] Funding Source: National Science Foundation
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [0801786] Funding Source: National Science Foundation
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We have investigated the thermal stability of femtosecond laser modification inside fused silica. Raman and FL spectroscopy show that fs-laser induced non-bridging oxygen hole center (NBOHC) defects completely disappear at 300 degrees C, whereas changes in Si-O ring structures only anneal out after heat treatment at 800-900 degrees C. After annealing at 900 degrees C optical waveguides written inside the glass had completely disappeared whereas more significant damage induced in the glass remained. The results are related to different types of bond rearrangements in the glass network. (C) 2013 Optical Society of America
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