A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

Through the use of a multi-layer phase mask to produce five-beam interference, three-dimensional photonic crystals can be formed through single exposure to a photoresist. In these holographically formed structures, the interconnectivity is controlled by the relative phase difference among contributing beams. Photonic band gaps are calculated and the simulation shows a maximum bandgap of 18% of the middle gap frequency when the phase difference is optimized. A three-layer phase mask is fabricated by placing a spacer layer between two orthogonally-orientated gratings. The phase difference is controlled by thermal-tuning of the spacer thickness. Photonic crystal templates are holographically fabricated in a photosensitive polymer using the phase mask. (C) 2011 Optical Society of America