Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 degrees C from a Ba0.96Ca0.04Ti0.82Zr0.18O3 (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Film texture and crystallinity were found to depend on both deposition temperature and substrate: above 600 degrees C, the as-deposited films consisted of well-facetted crystallites with the cubic perovskite structure. A strongly textured Pt (111) underlayer enhanced the (001) orientation of BCZTO films deposited at 900 degrees C, 10 mtorr pressure and 10% oxygen in argon. Similar films deposited onto a Pt (111) textured film at 700 degrees C and directly onto (100) Si wafers showed relatively larger (011) and diminished intensity (00l) diffraction peaks. Sputter ambients containing oxygen caused the Ni underlayers to oxidize even at 700 degrees C: Raising the process temperature produced more diffraction peaks of NiO with increased intensities. Thin-film capacitors were fabricated using similar to 500 nm thick BCZTO dielectrics and both Pt and Ni top and bottom electrodes. Small signal capacitance measurements were carried out to determine capacitance and parallel resistance at low frequencies and from these data, the relative permittivity (epsilon(r)) and resistivity (rho) of the dielectric films were calculated; values ranged from similar to 50 to >2,000, and from similar to 10(4) to similar to 10(10) Omega.cm, respectively.