Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds

We set out to study the use of a series of ruthenocenes as possible and promising sources for ruthenium and/or ruthenium oxide film formation. The thermal stability of a series of ruthenocenes, including (eta(5)-C(5)H(4)R)(eta(5)-C(5)H(4)R') Ru (1), R = R' = H (3), R = H, R' = CH(2)NMe(2) (5), R = H, R' = C(O) Me (6), R = R' = C(O) Me (7), R = H, R' = C(O)(CH(2)) (3)CO(2)H (8), R = H, R' = C(O)(CH(2))(2)CO(2)H (9), R = H, R' = C(O)(CH(2)) (3)CO(2)Me (10), R = H, R' = C(O)(CH(2))(2)CO(2)Me (11), R = R' = SiMe(3)), (eta(5)-C(4)H(3)O-2,4-Me(2)) (2)Ru (2), and (eta(5)-C(5)H(5)-2,4-Me(2))(2)Ru (4) was studied by thermogravimetry. From these studies, it could be concluded that 1-4, 6 and 9-11 are the most thermally stable molecules. The sublimation pressure of these sandwich compounds was measured using a Knudsen cell. Among these, the compound 11 shows the highest vapor pressure.