4.6 Article

A graphene/GaAs near-infrared photodetector enabled by interfacial passivation with fast response and high sensitivity

Journal

JOURNAL OF MATERIALS CHEMISTRY C
Volume 3, Issue 18, Pages 4723-4728

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c5tc00449g

Keywords

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Funding

  1. Natural Science Foundation of China (NSFC) [51172151, 21101051]
  2. Fundamental Research Funds for the Central Universities [2012HGCX0003, 2013HGCH0012, 2014HGCH0005]
  3. China Postdoctoral Science Foundation [103471013]
  4. Natural Science Foundation of the Anhui Province [J2014KZR0059, J2014KZR0042]

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We report a simple AlOx passivation approach to optimize the device performance of a bilayer graphene/gallium arsenide (BLG/GaAs) Schottky junction based near infrared photodetector (NIRPD). The as-fabricated NIRPD is highly sensitive to NIR illumination at zero bias voltage, with a detectivity of 2.88 x 10(11), which is much higher than that without passivation (7.3 x 10(9) cm Hz(1/2) W-1). The corresponding responsivity is 5 mA W-1. Additionally, the surface passivation can substantially increase both the response rate (rise/fall time tau(r)/tau(f) from 32/48 mu s to 320/380 ns), and lift time. It is expected that such a self-driven NIRPD with fast response and high detectivity will have great potential in the future optoelectronic devices.

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