Journal
ZEITSCHRIFT FUR KRISTALLOGRAPHIE-CRYSTALLINE MATERIALS
Volume 225, Issue 12, Pages 610-615Publisher
WALTER DE GRUYTER GMBH
DOI: 10.1524/zkri.2010.1354
Keywords
Coherent; Inhomogeneity; X-ray diffractive imaging; Silicon-On-Insulator
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Funding
- EPSRC [EP/G068437/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/G068437/1] Funding Source: researchfish
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We report our research on X-ray micro-beam diffraction and coherent X-ray diffractive imaging techniques to study structural inhomogeneities in Silicon-On-Insulator continuous plain wafers. Inhomogeneities were measured quantitatively and attributed to limitations of the manufacturing process. 3-dimensional image reconstructions were performed by using our Error-Reduction and Hybrid-Input-Output iterative algorithms. These revealed images of the focussed X-ray beam passing through the active layer of the wafer.
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