Journal
WATER RESEARCH
Volume 45, Issue 19, Pages 6371-6380Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.watres.2011.09.025
Keywords
UV/chlorine; AOP; ECs; EDCs; Advanced water treatment
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UV/chlorine (UV/HOCl and UV/ClO2) Advanced Oxidation Processes (AOPs) were assessed with varying process layout and compared to the state of the art UV/H2O2 AOP. The process comparison focused on the economical and energy saving potential of the UV/chlorine AOP. Therefore the experiments were performed at technical scale (250 L/h continuous flow reactor) and at process energies, oxidant and model contaminant concentrations expected in full scale reference plants. As model compounds the emerging contaminants (ECs): desethylatrazine, sulfamethoxazole, carbamazepine, diclofenac, benzotriazole, tolyltriazole, iopamidole and 17 alpha-ethinylestradiol (EE2) were degraded at initial compound concentrations of 1 mu g/L in tap water and matrixes with increased organic load (46 mg/L DOC). UV/chlorine AOP organic by-product forming potential was assessed for trihalomethanes (THMs) and N-Nitrosodimethylamine (NDMA). A process design was evaluated which can considerably reduce process costs, energy consumption and by-product generation from UV/HOCl AOPs. (C) 2011 Elsevier Ltd. All rights reserved.
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