4.8 Article

Anatoxin-a degradation by Advanced Oxidation Processes: Vacuum-UV at 172 nm, photolysis using medium pressure UV and UV/H2O2

Journal

WATER RESEARCH
Volume 44, Issue 1, Pages 278-286

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.watres.2009.09.021

Keywords

Anatoxin-a; Advanced Oxidation Processes; Vacuum-UV; Xenon excimer lamp; Photolysis; UV/H2O2

Funding

  1. Natural Sciences and Engineering Research Council of Canada (NSERC)
  2. Alberta ingenuity Center for Water Research (AICWR)

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Two Advanced Oxidation Processes, namely vacuum-ultraviolet (VUV) photolysis at 172 nm and ultraviolet/hydrogen peroxide (UV/H2O2) were investigated for the degradation of anatoxin-a in aqueous solutions. Solutions of anatoxin-a-fumarate were treated with VUV light at 172 nm with a UV dose of 200 mJ/cm(2), where fumaric acid served as a reference compound for a competition kinetics analysis. The second-order rate constant for the reaction between anatoxin-a and the hydroxyl radical was found to be (5.2 +/- 0.3) x 10(9) M-1 s(-1) and was independent of pH, temperature, and initial concentration of anatoxin-a. The direct photolysis of anatoxin-a using a medium pressure (MP) UV lamp was also investigated, in which case a UV dose of 1285 mJ/cm(2) was required to degrade anatoxin-a by 88% and 50% at concentrations of 0.6 mg/L and 1.8 mg/L of toxin, respectively. Treatment of anatoxin-a with a low pressure (LP) UV lamp in the presence of 30 mg/L of H2O2 was examined, where it was found that more than 70% of toxin could be degraded at a UV dose of 200 mJ/cm(2). The degradation arises from the oxidation of the toxin by hydroxyl radicals. The addition of H2O2 clearly enhanced the degradation of anatoxin-a, up to a concentration of 40 mg/L, after which addition of more H2O2 had little effect on the degradation kinetics of anatoxin-a. The effect of background constituents in the water on the degradation of anatoxin-a was also investigated using natural and synthetically produced model waters. (C) 2009 Elsevier Ltd. All rights reserved.

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