Journal
VACUUM
Volume 86, Issue 12, Pages 1916-1919Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2012.04.036
Keywords
Molybdenum; Thin film; Sputtering; CIGS
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Mo layers were deposited on soda lime glass via DC magnetron sputtering of a Mo target in a pure Ar atmosphere. The structure and electrical resistivity of Mo thin films, which may be varied by controlling the sputtering pressure, were investigated. The films showed (110) preferred orientation regardless of the working pressure. Films sputtered at low working pressure had low resistivity but adhered poorly to glass. A study of the deposition of a Mo bilayer was conducted. Optimum properties of the Mo bilayer were obtained when the bottom layer was deposited at 10 mtorr and the top layer was deposited at 2.5 mtorr. The extremely low resistivity of 6.57 mu Omega-cm was obtained, which is better than other literatures. A Cu(In, Ga)Se-2 cell fabricated on a Mo film sputtered under optimized conditions showed 10.40% efficiency. (C) 2012 Elsevier Ltd. All rights reserved.
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