Journal
VACUUM
Volume 85, Issue 10, Pages 949-954Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2011.02.002
Keywords
Magnetron sputtering; Nickel oxide; Thickness; Oxide coatings
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Nickel oxide thin films of various thicknesses were grown on glass substrates by dc reactive magnetron sputtering technique in a pure oxygen atmosphere with sputtering power of 150 W and substrate temperature of 523 K. Crystalline properties of NiO films as a function of film thickness were investigated using X-ray diffraction. XRD analysis revealed that (200) is the preferred orientation and the orientation of the films changed from (200) to (220) at film thickness of 350 nm. The maximum optical transmittance of 60% and band gap of 3.82 eV was observed at the film thickness of 350 nm. The lowest electrical resistivity of 5.1 0 Omega cm was observed at a film thickness of 350 nm, thereafter resistivity increases with film thickness. (C) 2011 Elsevier Ltd. All rights reserved.
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