Journal
VACUUM
Volume 85, Issue 4, Pages 531-534Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2010.09.002
Keywords
Nano-sheet carbon film; Titanium film; MWPCVD; Field emission; Electric field model
Ask authors/readers for more resources
Nano-sheet carbon films (NSCFs) coated with a 2-nm Ti layer were fabricated on n-type Si (110) by means of a quartz-tube-type microwave-plasma chemical-vapour-deposition (MWPCVD) method with hydrogen-methane gas mixture and an electron beam (EB) evaporation method. The field emission (FE) properties of the NSCF were changed by depositing a thin Ti film on its surface. The threshold field was decreased from 3.7 V/mu m to 2.5 V/mu m and the FE current density at a macroscopic electric field (E) of 10 V/mu m was decreased from 41.7 mA/cm(2) to 26.3 mA/cm(2) for Ti-coated NSCFs. Moreover, the saturation tendency of the emission current density was not improved for Ti-coated NSCFs. A three-region E model considering statistical size effects of FE tip structures in the low E region and space-charge-limited-current (SCLC) effects in the high E region was proposed and the FE data in the low, middle and high E regions were reasonably interpreted. (C) 2010 Elsevier Ltd. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available