Journal
VACUUM
Volume 84, Issue 9, Pages 1075-1079Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2010.01.029
Keywords
Magnetic materials; Ion beam etching; Shadowing effect; Geometry control
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In this paper, we described how to control the magnetic junction critical dimension (CD) and profile defined by ion beam milling and its implication to device performance. The impact of standing waves on breaking the photo-resist and on the resultant junction defects have been highlighted. The ideal device profile and geometry are also discussed. (C) 2010 Elsevier Ltd. All rights reserved.
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