Journal
ULTRAMICROSCOPY
Volume 134, Issue -, Pages 102-112Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2013.05.020
Keywords
EFTEM; Inelastic scattering; Zero-loss; Low-loss; Mutual coherence; Low voltage
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Funding
- DFG (German Research Foundation)
- Ministry of Science, Research and the Arts (MWK) of Baden-Wurttemberg
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We present model-based image simulations for zero-loss and plasmon-loss filtered images at 20 kV for graphene and silicon based on the mutual coherence approach. In addition, a new approximation for the mixed dynamic form factor is introduced. In our calculation multiple elastic scattering and one inelastic scattering are taken into account. The simulation shows that even the intensity of zero-loss filtered image is attenuated by the interference between inelastically scattered waves. Moreover, the intensity of lasmon-loss filtered images cannot be neglected, either. (C) 2013 Elsevier B.V. All rights reserved.
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