4.4 Article Proceedings Paper

Laser assisted atom probe analysis of thin film on insulating substrate

Journal

ULTRAMICROSCOPY
Volume 111, Issue 6, Pages 557-561

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2010.11.008

Keywords

Atom probe; Ultraviolet femtosecond laser; Insulating substrate

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Funding

  1. CREST, Japan Science and Technology Agency
  2. World Premier International (WPI) Research Center Initiative on Materials Nanoarchitronics, MEXT, Japan

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We demonstrate that the atom probe analyses of metallic thin films on insulating substrates are possible using laser assisted field evaporation. The tips with metallic thin film and insulating substrate (0.6-3 mu m in thickness) were prepared by the lift-out and annular ion beam milling techniques on tungsten supports. In spite of the existence of thick insulating layer between the metallic film and the tungsten support, atom probe tomography with practical mass resolution, signal-to-noise ratio and spatial resolution was found to be possible using laser assisted field evaporation. (C) 2010 Elsevier B.V. All rights reserved.

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