4.4 Article

Preparation of carbon-free TEM microgrids by metal sputtering

Journal

ULTRAMICROSCOPY
Volume 109, Issue 9, Pages 1105-1109

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2009.04.001

Keywords

Preparation; TEM; Microgrids; Sputtering

Categories

Funding

  1. Delft University of Technology (Kavli Institute for NanoScience)
  2. Albemarle Catalysts Company B.V.
  3. NWO ('Nederlandse Organisatie voor Wetenschappelijk Onderzoek')

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A new method for preparing carbon-free, temperature-stable Transmission Electron Microscope (TEM) grids is presented. An 80% Au/20% Pd metal film is deposited onto a 'holey' microgrid carbon supported on standard mixed-mesh Au TEM grids. Subsequently, the carbon film is selectively removed using plasma cleaning. In this way, an all-metal TEM film is made containing the 'same' microgrid as the original carbon film. Although electron transparency of the foil is reduced significantly, the open areas for TEM inspection of material over these areas are maintained. The metal foil can be prepared with various thicknesses and ensures good electrical conductivity. The new Au/Pd grids are stable to at least 775 K under vacuum conditions. (c) 2009 Elsevier B.V. All rights reserved.

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