Journal
THIN SOLID FILMS
Volume 540, Issue -, Pages 162-167Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2013.05.156
Keywords
Azo-polymer; Interference lithography; Metal nanostructures; Surface relief gratings
Categories
Funding
- Academy of Finland [134029]
- Academy of Finland (AKA) [134029, 134029] Funding Source: Academy of Finland (AKA)
Ask authors/readers for more resources
Metal micro- and nanostructures for optical and electronic applications are typically fabricated by means of interferometric optical or electron-beam lithographies using conventional photo-or electron-beam resists. In this work, we report on fabrication of periodic nanostructures of gold by exploiting photoinduced surface-relief gratings in an azobenzene-functionalized polymer film as masks for reactive ion etching of the metal. The proposed technique provides a convenient, fast and flexible alternative to photoresist-based lithography for fabricating metal nanostructures of large surface area. Owing to the fact that the azo-polymer is sensitive to the polarization rather than the intensity modulation of the exposing light, the technique is particularly suitable for patterning highly reflective surfaces. (C) 2013 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available