Journal
THIN SOLID FILMS
Volume 539, Issue -, Pages 274-277Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2013.05.005
Keywords
Gate dielectrics; Silica; Epoxy resin; Hybrid; Thin film
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Thermal-cured hybrid materials were synthesized from homogenous hybrid sols of epoxy resins and organoalkoxysilane-functionalized silica. The chemical structures of raw materials and obtained hybrid materials were characterized using Fourier transform infrared spectroscopy. The thermal resistance of the hybrids was enhanced by hybridization. The interaction between epoxy matrix and the silica particles, which caused hydrogen bonding and van der Waals force was strengthened by organoalkoxysilane. The degradation temperature of the hybrids was improved by approximately 30 degrees C over that of the parent epoxy material. The hybrid materials were formed into uniformly coated thin films of about 50 nm-thick using a spin coater. An optimum mixing ratio was used to form smooth-surfaced hybrid films. The electrical property of the hybrid film was characterized, and the leakage current was found to be well below 10(-6) A cm(-2). (C) 2013 Elsevier B.V. All rights reserved.
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