4.4 Article

Structure and morphology of aluminium doped Zinc-oxide layers prepared by atomic layer deposition

Journal

THIN SOLID FILMS
Volume 520, Issue 14, Pages 4703-4706

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2011.10.113

Keywords

Atomic layer deposition; TCO; ZnO; Aluminium doping; XRD; Resistivity; Orientation

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The aim of this work is to study the effects of deposition temperature and aluminium incorporation on the crystalline properties, orientation and grain size of atomic layer deposited ZnO layers. X-ray diffraction analysis revealed a change in the dominant crystallite orientation with increasing substrate temperature. The most perfect crystal structure and largest grain size was found at 2 at.% aluminium content. Accumulation of compressive strain developed a monotonous increase with the growth temperature. Electric resistivity showed no anisotropy despite the change in the orientation, therefore the dominant conduction mechanism is not grain boundary related.(C) 2011 Elsevier B.V. All rights reserved.

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