Journal
THIN SOLID FILMS
Volume 520, Issue 19, Pages 6328-6333Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2012.05.065
Keywords
Chromium; Thin films; Atomic force microscopy; Surface morphology; Nanostructure; X-ray photoelectron spectroscopy
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Funding
- Agency for Science, Innovation and Technology of Lithuania [31 V-148]
- Research Council of Lithuania
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Chromium (Cr) thin films were deposited on float glass using electron beam (e-beam) physical vapor deposition and radio frequency (RF) magnetron sputtering techniques. Surface morphology of these Cr films was studied using atomic force microscopy (AFM). The e-beam deposited Cr films consisted of isolated surface mounds while in RF sputtered samples, these mounds combined to form larger islands. Lower surface adhesive properties were observed for e-beam deposited films, as determined from AFM force-distance curves, presumably due to the nanostructural differences. Similar amounts of adsorbed atmospheric carbonaceous contaminants and water vapor were detected on samples deposited using both methods with e-beam deposited samples having additional carbide species, as determined by X-ray photoelectron spectroscopy data. The dominant crystallographic plane in both e-beam deposited and RF sputtered Cr thin films was (110) of body-centered cubic Cr metal structure as determined from X-ray diffraction data. Weak (211) reflection was also observed in RF sputtered samples and was attributed to a different thin Cr film condensation and growth-mechanism which resulted in nanostructural differences between films deposited using two different methods. (C) 2012 Elsevier B. V. All rights reserved.
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