The effect of deposition parameters and post treatment on the electrical properties of Mo thin films

In this study, we deposited low-resistivity molybdenum (Mo) thin films on soda-lime glass substrates with good adhesion. We adjusted various deposition parameters such as the sputtering power (52-102 W), working distance (5.5-9 cm) and annealing temperature (26-400 degrees C) to investigate their impact on the sheet resistance. By using a DC magnetron sputtering system, we obtained Mo thin films having the lowest sheet resistance of 0.190 Omega/square with a sputtering power of 82 W, working distance of 6.5 cm, and annealing temperature of 400 degrees C; in addition, these films had good adhesivity. These Mo thin films were suitable for use as the Mo back contact in Cu(In, Ga)Se-2-based solar cells. (C) 2012 Elsevier B. V. All rights reserved.