4.4 Article Proceedings Paper

SnS thin-films by RF sputtering at room temperature

Journal

THIN SOLID FILMS
Volume 519, Issue 21, Pages 7421-7424

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.12.186

Keywords

Tin sulfide; Tin monosulfide; RF sputtering; Solar cells; Photovoltaics

Funding

  1. Chesonis Family Foundation
  2. U.S. Department of Energy [DE-SC0001630]
  3. Department of Defense
  4. National Science Foundation [ECS-0335765]
  5. U.S. Department of Energy (DOE) [DE-SC0001630] Funding Source: U.S. Department of Energy (DOE)

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Tin monosulfide (SnS) is of interest as a potential solar cell absorber material. We present a preliminary investigation of the effects of sputtering conditions on SnS thin-film structural, optical, and electronic properties. Films were RF sputtered from an SnS target using an argon plasma. Resistivity, stoichiometry, phase, grain size and shape, bandgap, and optical absorption coefficient can be varied by modifying argon pressure for a fixed deposition time. Most films have an indirect bandgap in the range of 1.08-1.18 eV. XRD patterns confirmed the films as mostly crystalline, and grain morphology was examined using profile and surface SEM images. (C) 2011 Elsevier B.V. All rights reserved.

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