Journal
THIN SOLID FILMS
Volume 518, Issue 19, Pages 5463-5466Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.04.018
Keywords
Barrier coating; Atomic layer deposition; Electron beam evaporation; Magnetron sputtering; Sol-gel; Aluminum oxide
Categories
Funding
- Metsaliitto Group
- Myllykoski Corporation
- Stora Enso Oyj
- UPM-Kymmene Oyj
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Atomic layer deposition (ALD), electron beam evaporation, magnetron sputtering and a sol gel method were used to deposit thin aluminum oxide coatings onto two different fiber-based packaging materials of commercial board grades coated with synthetic and biodegradable polymers. Significant decreases in both the water vapor and oxygen permeation rates were observed. With each technique the barrier performance was improved. However, among the techniques tested ALD was found to be most suitable. Our results moreover revealed that biodegradable polylactic acid-coated paperboard with a 25-nm thick layer of aluminum oxide grown by ALD on top of it showed promising barrier characteristics against water vapor and oxygen. (C) 2010 Elsevier B.V. All rights reserved.
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