Journal
THIN SOLID FILMS
Volume 518, Issue 20, Pages 5762-5768Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.05.095
Keywords
Coatings; Sputtering; X-ray diffraction; Scanning electron microscopy; Surface morphology; Hardness
Categories
Funding
- management of Charotar University of Science and Technology, Changa
- AICTE, New Delhi, in India
Ask authors/readers for more resources
Chromium nitride thin films were deposited on SA-304 stainless steel substrates by using direct-current reactive magnetron sputtering. The influence of process conditions such as nitrogen content in the fed gas, substrate temperature, and different sputtering gases on microstructural characteristics of the films was investigated. The films showed (200) preferred orientation at low nitrogen content (<30%) in the fed gas. The formation of Cr2N and CrN phases was observed when 30% and 40% N-2 were used, with a balance of Ar, respectively. Field emission scanning electron microscopy and atomic force microscopy were used to characterize the morphology and surface topography of the thin films, respectively. Microhardness tests showed a maximum hardness of 16.95 GPa for the 30% nitrogen content. (C) 2010 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available