Nanostructured tungsten and tungsten trioxide films prepared by glancing angle deposition

Nanostructured tungsten (W) and tungsten trioxide (WO(3)) fin-is were prepared by glancing angle deposition using pulsed direct current magnetron sputtering at room temperature with continuous substrate rotation. The chemical compositions of the nanostructured films were characterized by X-ray photoelectron spectroscopy, and the film structures and morphologies were investigated using X-ray diffraction and high resolution scanning electron microscopy. Both as-deposited and air annealed tungsten trioxide films exhibit nanostructured morphologies with an extremely high surface area, which may potentially increase the sensitivity of chemiresistive WO(3) gas sensors. Metallic W nanorods formed by sputtering in a pure Ar plasma at room temperature crystallized into a predominantly simple cubic beta-phase with < 100 > texture although evidence was found for other random grain orientations near the film/substrate interface. Subsequent annealing at 500 degrees C in air transformed the nanorods into polycrystalline triclinic/monoclinic WO(3) structure and the nanorod morphology was retained. Substoichiometric WO(3) films grown in an Ar/O(2) plasma at room temperature had an amorphous structure and also exhibited nanorod morphology. Post-deposition annealing at 500 degrees C in air induced crystallization to a polycrystalline triclinic/monoclinic WO(3) phase and also caused a morphological change from nanorods into a nanoporous network. (C) 2009 Elsevier B.V. All rights reserved.