4.4 Letter

Fully strained low-temperature epitaxy of TiN/MgO(001) layers using high-flux, low-energy ion irradiation during reactive magnetron sputter deposition

Journal

THIN SOLID FILMS
Volume 518, Issue 18, Pages 5169-5172

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.04.028

Keywords

Epitaxy; Sputter deposition; Transition metal nitrides

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