Journal
THIN SOLID FILMS
Volume 518, Issue 4, Pages 1095-1098Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.03.224
Keywords
Thin film; Magnetron sputtering; Metal-insulator-transition
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In the present work thin films of Ti-Me (where Me: V, Nb, Ta) were deposited onto glass substrates by magnetron sputtering of mosaic target in reactive oxygen plasma. The properties of the prepared thin films were studied by X-ray diffraction (XRD), electron dispersive spectroscopy, temperature-dependent electrical and optical transmission spectroscopy measurements. The structural investigations indicate that thin films were XRD-amorphous. Reversible thermo resistance effect, recorded at 52 +/- 1 degrees C was found from electrical measurements. The prepared coatings were well transparent in the visible part of the light spectrum from ca. 350 nm. (C) 2009 Elsevier B.V. All rights reserved.
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