Journal
THIN SOLID FILMS
Volume 517, Issue 20, Pages 5808-5812Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.02.146
Keywords
Erbium; Nanocrystalline silicon; Photoluminescence
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Funding
- FCT [POCTI/CTM/39395/2001]
- INTAS [03-51-6486]
- Fundação para a Ciência e a Tecnologia [SFRH/BSAB/105789/2014, POCTI/CTM/39395/2001] Funding Source: FCT
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Erbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spectroscopic ellipsometry and Rutherford backscattering techniques. Variation of deposition parameters was used to deposit films with different crystalline fraction and crystallite size. Photoluminescence measurements revealed a correlation between film microstructure and the Er3+ photoluminescence efficiency. (C) 2009 Elsevier B.V. All rights reserved.
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