Journal
THIN SOLID FILMS
Volume 518, Issue 1, Pages 174-179Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.06.017
Keywords
Si-B-C-N films; Magnetron co-sputtering; Bonding structure; Hardness; Optical properties; Thermal stability
Categories
Funding
- Ministry of Education of the Czech Republic [MSM 4977751302]
- Natural Sciences and Engineering Research Council (NSERC) of Canada
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Quaternary Si-B-C-N materials are becoming increasingly attractive due to their possible high-temperature and harsh-environment applications. In this work, amorphous Si-B-C-N films with two compositions (Si34B9C4N49 and Si36B13C7N40) and low contamination level (H + O + Ar<4 at.%) were deposited on silicon substrates by reactive dc magnetron co-sputtering using two different targets and gas mixtures. Thermal stability of these films was investigated in terms of composition, bonding structure, as well as mechanical and optical proper-ties after annealing in helium up to a 1300 degrees C substrate limit. Films with a high nitrogen content (Si34B9C4N49, i.e. N/[Si + B + C]similar to 1.0) were found to be stable up to 1300 degrees C. After annealing, the hardness and elastic recovery of those films slightly increased up to 27 GPa and 84%, respectively, and the reduced Young's modulus remained practically constant (similar to 170 GPa). The refractive index and the extinction coefficient at 550 nm were evaluated at 2.0 and 5 x 10(-4), respectively, and the optical band gap was approximately 3.0 eV. In contrast, films with a lower nitrogen content (Si36B13C7N40, i.e. N/[Si + B + C]similar to-0.7) were stable only up to 1200 degrees C. Both Si-B-C-N materials studied here exhibited extremely high oxidation resistance in air up to the 1300 degrees C substrate limit. (C) 2009 Elsevier B.V. All rights reserved.
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