Multilayer film deposition of Ag and SiO2 nanoparticles using a spin coating process

This paper describes the multilayer film deposition of Ag and SiO2 nanoparticles using a spin coating process combined with ion-sputtering. The Ag-layer thickness was varied from 20 to 80 nm by controlling the Ag concentration in the colloidal solution. Ion-sputtering was found to be a suitable method of surface modification and prevented phase separation during film deposition. The number of layers ranged from one to ten. Cross-section scanning electron microscope images revealed that the deposited multilayer films had laminated structures with high continuity. The optical properties of the prepared multilayer films also were investigated. (C) 2008 Elsevier B.V. All rights reserved.