Tailored Ag nanoparticle array fabricated by block copolymer photolithography

Periodic arrays of metallic Ag nanoparticles have been fabricated on various solid substrates for the potential application in nano-electronics and nano-photonics by block copolymer photolithography. Spin-coated diblock copolymer thin film with well-ordered and vertically oriented cylindrical nanodomains was utilized as the template. Ag+ was selectively doped in the cylindrical nanodomain by just placing a few drops of AgNO3 aqueous solution on the film. Both photochemical reduction of Ag+ to metallic Ag and concomitant photo-etching of the diblock copolymer template have been achieved under vacuum ultraviolet light irradiation, resulting in a direct transcription of the periodic pattern of diblock copolymer template to the metallic Ag nanoparticle array with the consistent periodicity. (c) 2007 Elsevier B.V. All rights reserved.