Journal
THIN SOLID FILMS
Volume 516, Issue 9, Pages 2577-2581Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2007.04.126
Keywords
block copolymer; photolithography; periodic array; plasmonic
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Periodic arrays of metallic Ag nanoparticles have been fabricated on various solid substrates for the potential application in nano-electronics and nano-photonics by block copolymer photolithography. Spin-coated diblock copolymer thin film with well-ordered and vertically oriented cylindrical nanodomains was utilized as the template. Ag+ was selectively doped in the cylindrical nanodomain by just placing a few drops of AgNO3 aqueous solution on the film. Both photochemical reduction of Ag+ to metallic Ag and concomitant photo-etching of the diblock copolymer template have been achieved under vacuum ultraviolet light irradiation, resulting in a direct transcription of the periodic pattern of diblock copolymer template to the metallic Ag nanoparticle array with the consistent periodicity. (c) 2007 Elsevier B.V. All rights reserved.
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