Synthesis of Ti3Al and TiAl based surface alloys by pulsed electron-beam melting of Al(film)/Ti(substrate) system

Phase formation and surface hardening in the 100-nm-thick Al(film)/Ti(substrate) system under conditions of pulsed electron-beam melting 15 keV, similar to 3 mu s, 3-4 J/cm(2)) have been studied depending on the number (similar to of film deposition-melting cycles. Using this method, submicrocrystalline and nanocrystalline surface alloys with thicknesses a parts per thousand yen3 mu m based on Ti3Al and TiAl intermetallics have been obtained on the titanium substrate.