Journal
SURFACE AND INTERFACE ANALYSIS
Volume 44, Issue 11-12, Pages 1456-1458Publisher
WILEY-BLACKWELL
DOI: 10.1002/sia.4974
Keywords
ternary alloys; film thickness; elemental composition; quantification; k-values; ED-EPMA; STRATAGEM
Categories
Funding
- Deutsche Forschungsgemeinschaft [UN 80/10-2, MO599/30-2]
- BAM Doktorandenprogramm
Ask authors/readers for more resources
Ternary thin film alloys based on Pd, Ni and Co on silicon wafers have been characterized in order to determine elemental composition and thickness. A broad variety of alloy compositions was obtained on one and the same substrate by magnetron dc-co-sputter deposition. Energy-dispersive electron probe X-ray microanalysis of these multi alloy composition samples is performed in a non-destructive, precise and, if optimized, also in a time-saving way. The local thickness of the layers under study was in between 50 nm and 250 nm. Pure element bulk materials have been employed as reference specimens. The results attained in this study are compared to those obtained by other analytical methods as Auger electron spectroscopy and X-ray photo electron spectroscopy. Copyright (C) 2012 John Wiley & Sons, Ltd.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available