4.2 Article

Near ambient pressure XPS with a conventional X-ray source

Journal

SURFACE AND INTERFACE ANALYSIS
Volume 44, Issue 8, Pages 1100-1103

Publisher

WILEY-BLACKWELL
DOI: 10.1002/sia.4826

Keywords

near ambient pressure XPS; conventional X-ray source; silver in N2 and in H2O

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The Leibniz-Institut fur Analytische WissenschaftenISASe.V. recently acquired a new XPS system from SPECS for measurements at near atmospheric pressures and using a conventional laboratory X-ray source (Al Ka and Mg Ka). This allows the in situ analysis of gassurface interactions under reaction conditions to study, for example, heterogeneous catalysis and corrosion. Furthermore, with operating pressures of up to approximately 0.5?mbar, it is possible to set up a water atmosphere that stabilises biological molecules, for example, lipid bilayer films on metal surfaces. By using a conventional laboratory X-ray source, the radiation damage to these molecules can be minimised. Measurements to establish optimal parameters for operation of the instrument have been completed, and the results are discussed. Future modifications to improve photon and electron flux are presented. The first experimental data obtained with this instrument are also shown. Copyright (c) 2012 John Wiley & Sons, Ltd.

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