Journal
SURFACE AND INTERFACE ANALYSIS
Volume 43, Issue 1-2, Pages 198-200Publisher
WILEY
DOI: 10.1002/sia.3422
Keywords
TOF-SIMS; organic depth profiling; dual beam mode; C-60; Bi-n; Irganox 1010; Irganox 3114; organic multilayer sample
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The dual beam mode of depth profiling has been used to investigate the influence of sputter beam energy, angle and sample rotation on the quality of organic depth profiles in a TOF-SIMS instrument. The sample under investigation was a multilayer sample consisting of Irganox 3114 embedded in a Irganox 1010 matrix provided by NPL. C-60 sputter beam energies between 10 and 30 keV, and angles of 45 degrees and 75 degrees were used. The results are discussed with respect to depth resolution, constancy of the sputter rate and quantification possibilities. Copyright (C) 2010 John Wiley & Sons, Ltd.
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