Journal
SURFACE & COATINGS TECHNOLOGY
Volume 205, Issue -, Pages S573-S576Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2010.12.027
Keywords
Nanocluster; Reactive sputtering; Cluster formation; Gas aggregation
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Copper and titanium nanoclusters in Ar and in Ar+O(2) gas mixtures were prepared using a magnetron based gas aggregation cluster source designed for Ultra High Vacuum operation. A considerable influence of oxygen addition on the formation of clusters was observed even at oxygen-to-argon admixture levels of the order of 1:1000. A quadrupole mass filter determined nanocluster size distribution while the total deposition rate was determined by quartz crystal measurements. (C) 2010 Elsevier B.V. All rights reserved.
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