One-step process to deposit a soft super-hydrophobic film by filamentary dielectric barrier discharge-assisted CVD using HMCTSO as a precursor

In this study, a relatively simple process is used to deposit a soft super-hydrophobic film using hexamethylcyclotrisiloxane as a precursor by dielectric barrier discharge-assisted chemical vapor deposition. The purpose of this study is to introduce a phenomenon of the creation of a double rough structure on a substrate. A maximum contact angle of approximately 162 degrees was obtained and the film grew in the shape of a double roughness structure, similar to a lotus leaf, indicating a super-hydrophobic surface. The results of the aging test indicated that the as-grown super-hydrophobic surface was stable against moisture and was only dependent on the growing structure of films. (C) 2009 Elsevier B.V. All rights reserved.