Journal
SURFACE & COATINGS TECHNOLOGY
Volume 202, Issue 8, Pages 1551-1555Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2007.07.010
Keywords
V2O5; thin films; atomic force microscopy (AFM); Raman spectroscopy; transmission electron microscopy (TEM)
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V2O5 films were grown onto MgO (100) substrates by reactive magnetron sputtering between 26 degrees C to 300 degrees C to establish a detailed synthesis-structure relation. The effect of deposition temperature on structural characteristics and surface morphology was characterized using Xray diffraction, Raman spectroscopy, atomic force microscopy and scanning and transmission electron microscopy. Films prepared at room temperature are amorphous while those deposited above 80 degrees C exhibit a polycrystalline structure with the orthorhombic symmetry of the V2O5 phase. (c) 2007 Elsevier B.V. All rights reserved.
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