Journal
SUPERLATTICES AND MICROSTRUCTURES
Volume 75, Issue -, Pages 477-484Publisher
ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.spmi.2014.07.050
Keywords
ZnO; Solar cells; Photovoltaic; Atomic Layer Deposition; ALD; Resistivity; X-rays diffraction
Categories
Ask authors/readers for more resources
Atomic Layer Deposition (ALD) is a vapor phase thin film deposition technique, performed at low substrate temperatures, which enables the deposition of extremely uniform thin films. This technique is scalable up to very large substrates, making it very interesting for industrial applications. On the other hand, ZnO, both undoped and aluminum doped is commonly used as a transparent electrode in solar cells based on Cu(In,Ga)Se-2 (CIGS), and is usually deposited by Physical Vapor Deposition techniques. In this paper, we investigate the potential of ALD for the deposition of ZnO windows for solar cell applications. Thin films of a few hundreds of nanometers were grown by ALD, both undoped and doped with aluminum. They were studied by X-ray diffraction, electrical transport measurements, Atomic Force Microscopy and transmittance experiments. (C) 2014 Elsevier Ltd. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available